Specification：Meet the following criteria

The new fluorine-containing FSU-8 photoresist is a negative-tone, epoxy-based, near-ultraviolet photoresist, with the advantages of traditional SU-8 photoresist: suitable for the preparation of high aspect ratio microstructures, can be obtained with vertical side wall and high aspect ratio thick film graphics; it also has good mechanical properties, chemical resistance and thermal stability. FSU-8 contains a large number of C-F bonds, which can further increase the corrosion resistance and weather resistance of the material, and has extremely low optical loss, low birefringence, and high stability at communication wavelengths (850, 1310, 1550nm). The refractive index of the material is adjustable in the range of 1.483 to 1.588, and it is suitable for making optical communication, modulation, transmission and other devices such as arrayed optical waveguides, gratings, and straight waveguides.